CHEMICAL-VAPOR-DEPOSITION OF ZRO2 THIN-FILMS MONITORED BY IR SPECTROSCOPY

被引:38
作者
GOULD, BJ [1 ]
POVEY, IM [1 ]
PEMBLE, ME [1 ]
FLAVELL, WR [1 ]
机构
[1] UNIV MANCHESTER,INST SCI & TECHNOL,DEPT CHEM,MANCHESTER M60 1QD,LANCS,ENGLAND
关键词
D O I
10.1039/jm9940401815
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of ZrO2 have been grown under kinetic control by decomposition of zirconium tetra-tert-butoxide onto quartz substrates. The resulting films have been characterised by optical and electron microscopy and X-ray diffraction. A phase transition from a poorly crystalline, metastable form of zirconia to the monoclinic phase showing a strong preferred orientation takes place as the substrate temperature is raised from 450 to 500 degrees C. The decomposition of the precursor has been followed by ex situ infrared spectroscopy, allowing monitoring of the gas-phase products as a function of substrate temperature. The possible mechanism for the decomposition reaction is discussed.
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页码:1815 / 1819
页数:5
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