ELECTRODEPOSITION PROCESS FOR FABRICATION OF CONDUCTOR 1ST, SLM 2-MU BUBBLE MEMORY

被引：0
|
作者：
BLAKESLEE, MC [1 ]
ROMANKIW, LT [1 ]
ACOSTA, RE [1 ]
KRONGELB, S [1 ]
STOEBER, B [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 03期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C152 / C152
页数：1
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