X-RAY MASK HEATING DURING ELECTRON-BEAM PATTERNING

被引：6

作者：

KARNEZOS, M

WEIMAR, P

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583882

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：278 / 282

页数：5

共 11 条

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[3]

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[7] INFLUENCE OF ABSORBER STRESS ON THE PRECISION OF X-RAY MASKS [J].

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[8]

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[10]

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