X-RAY MASK HEATING DURING ELECTRON-BEAM PATTERNING

被引：6
|
作者：
KARNEZOS, M
WEIMAR, P
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期
关键词：
D O I：
10.1116/1.583882
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：278 / 282
页数：5
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