GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITED FILM THICKNESS

被引：42

作者：

GREENE, JE

SEQUEDAO.F

机构：

[1] UNIV ILLINOIS, DEPT MECH & IND ENGN, URBANA, IL 61801 USA

[2] UNIV ILLINOIS, DEPT MIN & MET, COORDINATED SCI LAB, URBANA, IL 61801 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.1318510

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1144 / 1149

页数：6

共 50 条

[1] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITION
SEQUEDAO.F
GREENE, JE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 174 - 174
[2] GLOW-DISCHARGE OPTICAL SPECTROSCOPY
WALKER, J
NATURE, 1974, 252 (5485) : 632 - 632
[3] REAL-TIME SPUTTER DEPOSITION MONITORING USING GLOW-DISCHARGE MASS-SPECTROSCOPY
BOLKER, BFT
SOLID STATE TECHNOLOGY, 1983, 26 (12) : 115 - 119
[4] OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION
GREENE, JE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05): : 1718 - 1729
[5] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MICROVOLUME ELEMENTAL ANALYSIS
GREENE, JE
SEQUEDAOSORIO, F
NATARAJAN, BR
JOURNAL OF APPLIED PHYSICS, 1975, 46 (06) : 2701 - 2709
[6] GLOW-DISCHARGE OPTICAL SPECTROSCOPY AS A DIAGNOSTIC OF SPUTTERED PERMALLOY FILM COMPOSITION AND SATURATION MAGNETOSTRICTION
PAGE, RH
GUDEMAN, CS
NOVOTNY, VJ
JOURNAL OF APPLIED PHYSICS, 1989, 65 (09) : 3586 - 3596
[7] GLOW-DISCHARGE ATOMIC SPECTROSCOPY
BROEKAERT, JAC
APPLIED SPECTROSCOPY, 1995, 49 (07) : A12 - A19
[8] THE EFFECT OF FILM THICKNESS ON THE REFLECTIVITY OF GLOW-DISCHARGE AMORPHOUS-SILICON
DONNADIEU, A
WEISER, G
BEICHLER, J
SOLAR ENERGY MATERIALS, 1981, 4 (04): : 455 - 459
[9] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR ANALYSIS OF THIN-FILMS
GREENE, JE
WHELAN, JM
JOURNAL OF APPLIED PHYSICS, 1973, 44 (06) : 2509 - 2513
[10] GLOW-DISCHARGE OPTICAL SPECTROSCOPY AS AN ANALYTICAL DEPTH PROFILING TECHNIQUE
GREENE, JE
SEQUEDAOSORIO, F
NATARAJAN, BR
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 366 - 369

← 1 2 3 4 5 →