SIGNIFICANCE OF ELECTRIC-FIELDS ON GROWTH OF THIN METAL-FILMS

被引：10

作者：

MURR, LE

SINGH, HP

机构：

来源：

APPLIED PHYSICS LETTERS | 1972年 / 20卷 / 12期

关键词：

D O I：

10.1063/1.1654039

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：512 / &

共 16 条

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[3]

BETHGE H, 1969, MOL PROCESSES SOLID, P569

[4]

Chopra K.L, 1969, THIN FILM PHENOMENA

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[7] POSSIBLE INFLUENCE OF ELECTRIC CHARGE EFFECTS ON INITIAL GROWTH PROCESSES OCCURRING DURING VAPOR DEPOSITION OF METAL FILMS ONTO SUBSTRATES INSIDE ELECTRON MICROSCOPE [J].

DOVE, DB .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2785-&

[8]

INO S, 1966, ELECTRON MICROSCOPY, V1, P521

[9] INFLUENCE OF CHARGE EFFECTS ON GROWTH AND ELECTRICAL RESISTIVITY OF THIN METAL FILMS [J].

KENNEDY, DI ;

HAYES, RE ;

ALSFORD, RW .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (04) :1986-&

[10] EFFECTS OF VACUUM ENVIRONMENT ON SUB-STRUCTURE OF EVAPORATED FCC METAL FILMS [J].

MURR, LE ;

INMAN, MC .

PHILOSOPHICAL MAGAZINE, 1966, 14 (127) :135-&

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