DEEP RADIATIVE LEVELS IN AS-GROWN AND IMPLANTED RAPID THERMAL ANNEALED INP

被引:19
作者
RAO, MV
AINA, OA
FATHIMULLA, A
THOMPSON, PE
机构
[1] BENDIX AEROSP TECHNOL CTR,COLUMBIA,MD 21045
[2] USN,RES LAB,WASHINGTON,DC 20375
关键词
D O I
10.1063/1.341677
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2426 / 2433
页数:8
相关论文
共 31 条
[22]   2-STEP RAPID THERMAL ANNEALING OF SI-IMPLANTED INP-FE [J].
RAO, MV ;
THOMPSON, PE .
APPLIED PHYSICS LETTERS, 1987, 50 (20) :1444-1446
[23]  
SCHNEIDER J, 1982, SEMIINSULATING 3 5 M, P144
[24]   PHOTOLUMINESCENCE IDENTIFICATION OF THE C AND BE ACCEPTOR LEVELS IN INP [J].
SKROMME, BJ ;
STILLMAN, GE ;
OBERSTAR, JD ;
CHAN, SS .
JOURNAL OF ELECTRONIC MATERIALS, 1984, 13 (03) :463-491
[25]   A PHOTOLUMINESCENCE STUDY OF CD-RELATED CENTERS IN INP [J].
SWAMINATHAN, V ;
DONNELLY, VM ;
LONG, J .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (12) :4565-4572
[26]   DEEP RADIATIVE LEVELS IN INP [J].
TEMKIN, H ;
DUTT, BV ;
BONNER, WA ;
KERAMIDAS, VG .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (11) :7526-7533
[27]   PHOTO-LUMINESCENCE STUDY OF MELT GROWN INP [J].
TEMKIN, H ;
BONNER, WA .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) :397-401
[28]   RAPID THERMAL ANNEALING OF 200-DEGREES-C MERCURY IMPLANTS INTO INP [J].
WILKIE, JH ;
SEALY, BJ .
ELECTRONICS LETTERS, 1986, 22 (24) :1308-1309
[29]   INDIUM-PHOSPHIDE .1. PHOTOLUMINESCENCE MATERIALS STUDY [J].
WILLIAMS, EW ;
ELDER, W ;
ASTLES, MG ;
WEBB, M ;
MULLIN, JB ;
STRAUGHAN, B ;
TUFTON, PJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (12) :1741-1749
[30]  
WILLIAMS EW, 1972, SEMICONDUCT SEMIMET, V8, pCH5