PLASMA-PROMOTED DEPOSITION OF THIN INORGANIC FILMS

Thin-film deposition utilizing low-pressure CVD promoted by a glow discharge has graduated in recent years from laboratory to production scale in the microelectronics, optics, and solar-energy fields. We review its present status, emphasizing the complexity of phenomena in the discharge and the consequent empirical nature of process control. In addition to the nature of the glow discharge plasma, we discuss physical and chemical characteristics of films which have been made to date; the equipment used on a commercial scale, with recommended features, and comments on operating problems, safety, and maintenance; and the influences of the many machine and operating parameters, with examples from experience with plasma silicon nitride, probably the most common use of plasma deposition today.