CHEMICALLY BOUND HYDROGEN IN CVD SI3N4 - DEPENDENCE ON NH3/SIH4 RATIO AND ON ANNEALING

被引：99
|
作者：
STEIN, HJ
WEGENER, HAR
机构：
[1] SANDIA LABS,ALBUQUERQUE,NM 87115
[2] SPERRY RAND CORP,RES CTR,SUDBURY,MA 01776
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 06期
关键词：
D O I：
10.1149/1.2133451
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：908 / 912
页数：5
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