CHEMICALLY BOUND HYDROGEN IN CVD SI3N4 - DEPENDENCE ON NH3/SIH4 RATIO AND ON ANNEALING

被引：99

作者：

STEIN, HJ

WEGENER, HAR

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

[2] SPERRY RAND CORP,RES CTR,SUDBURY,MA 01776

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 06期

关键词：

D O I：

10.1149/1.2133451

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：908 / 912

页数：5

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