PROPERTIES OF SN-DOPED IN2O3 BY REACTIVE MAGNETRON SPUTTERING AND SUBSEQUENT ANNEALING

被引：35
作者：
YAMAMOTO, S
YAMANAKA, T
UEDA, Z
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词：
D O I：
10.1116/1.574889
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1952 / 1955
页数：4
相关论文
共 7 条
[1]   PREPARATION OF CONDUCTING AND TRANSPARENT THIN-FILMS OF TIN-DOPED INDIUM OXIDE BY MAGNETRON SPUTTERING [J].
BUCHANAN, M ;
WEBB, JB ;
WILLIAMS, DF .
APPLIED PHYSICS LETTERS, 1980, 37 (02) :213-215
[2]   X-RAY PHOTOEMISSION SPECTROSCOPY STUDIES OF SN-DOPED INDIUM-OXIDE FILMS [J].
FAN, JCC ;
GOODENOUGH, JB .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) :3524-3531
[3]   ELECTRICAL-PROPERTIES AND DEFECT MODEL OF TIN-DOPED INDIUM OXIDE LAYERS [J].
FRANK, G ;
KOSTLIN, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 27 (04) :197-206
[4]   PROPERTIES OF SN-DOPED INDIUM OXIDE COATINGS DEPOSITED ON POLYESTER FILM BY HIGH-RATE REACTIVE SPUTTERING [J].
ITOYAMA, K .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (04) :691-694
[5]   TRANSPARENT CONDUCTING OXIDES OF METALS AND ALLOYS MADE BY REACTIVE MAGNETRON SPUTTERING FROM ELEMENTAL TARGETS [J].
LEWIN, R ;
HOWSON, RP ;
BISHOP, CA ;
RIDGE, MI .
VACUUM, 1986, 36 (1-3) :95-98
[6]  
SMITH FTJ, 1986, J ELECTROCHEM SOC, V128, P2388
[7]  
Sobajima S., 1974, JPN J APPL PHYS PT 1, V2, P475
1