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HIGH-POWER 0.98-MU-M STRAINED-QUANTUM-WELL LASERS FABRICATED USING IN-SITU MONITORED REACTIVE ION-BEAM ETCHING
被引:11
|作者:
HAMAMOTO, K
CHIDA, H
MIYAZAKI, T
ISHIKAWA, S
机构:
[1] Opto-Electronics Research Laboratories, NEC Corporation, Tsukuba, Ibaraki 305
关键词:
D O I:
10.1109/68.388737
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
0.98-mu m wavelength strained quantum-well buried ridge lasers were fabricated using in situ monitored reactive ion beam etching (RIBE). This technique allowed a very accurate ridge geometry, resulting in high single transverse-mode power more than 250 mW and high-fiber coupled power more than 150 mW.
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页码:602 / 604
页数:3
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