HEAVY-ATOM HOLOGRAPHY IN ELECTRON-MICROSCOPY

被引：0
|
作者：
GABOR, D
机构：
来源：
ISRAEL JOURNAL OF TECHNOLOGY | 1980年 / 18卷 / 05期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：209 / 213
页数：5
相关论文
共 50 条
  • [1] ORGANOSILYL PHOSPHOTUNGSTATES AS HEAVY-ATOM LABELS FOR ELECTRON-MICROSCOPY
    JOSHI, VN
    HAINFELD, JF
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1994, 207 : 201 - INOR
  • [2] ATOMIC-STRUCTURE OF SI(111)-(5X2)-AU FROM HIGH-RESOLUTION ELECTRON-MICROSCOPY AND HEAVY-ATOM HOLOGRAPHY
    MARKS, LD
    PLASS, R
    PHYSICAL REVIEW LETTERS, 1995, 75 (11) : 2172 - 2175
  • [3] HOLOGRAPHY IN ELECTRON-MICROSCOPY
    HANSZEN, KJ
    ADVANCES IN ELECTRONICS AND ELECTRON PHYSICS, 1982, 59 : 1 - 77
  • [4] HEAVY-LIGHT ATOM DISCRIMINATION IN ELECTRON-MICROSCOPY
    DOWNING, KH
    EXPERIENTIA, 1976, 32 (06): : 792 - 792
  • [5] HOLOGRAPHY AND TRANSMISSION ELECTRON-MICROSCOPY
    MATTEUCCI, G
    POZZI, G
    TONOMURA, A
    JOURNAL DE PHYSIQUE IV, 1993, 3 (C7): : 2063 - 2072
  • [6] THE IMAGE HOLOGRAPHY METHOD IN ELECTRON-MICROSCOPY
    CHEN, JW
    JOURNAL OF MODERN OPTICS, 1987, 34 (12) : 1525 - 1534
  • [7] INTERFERENCE ELECTRON-MICROSCOPY BY MEANS OF HOLOGRAPHY
    ENDO, J
    MATSUDA, T
    TONOMURA, A
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (12) : 2291 - 2294
  • [8] Relativistic heavy-atom effects on heavy-atom nuclear shieldings
    Lantto, Perttu
    Romero, Rodolfo H.
    Gomez, Sergio S.
    Aucar, Gustavo A.
    Vaara, Juha
    JOURNAL OF CHEMICAL PHYSICS, 2006, 125 (18):
  • [9] ELECTRON HOLOGRAPHY SURMOUNTS RESOLUTION LIMIT OF ELECTRON-MICROSCOPY
    ORCHOWSKI, A
    RAU, WD
    LICHTE, H
    PHYSICAL REVIEW LETTERS, 1995, 74 (03) : 399 - 402
  • [10] Heavy-atom derivatization
    Garman, E
    Murray, JW
    ACTA CRYSTALLOGRAPHICA SECTION D-STRUCTURAL BIOLOGY, 2003, 59 : 1903 - 1913
12345