TEMPERATURE DEPENDENCE OF DISSOCIATIVE RECOMBINATION AND MOLECULAR-ION FORMATION IN HE NE AND AR PLASMAS

被引:38
作者
CHEN, CJ
机构
[1] Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA
来源
PHYSICAL REVIEW | 1969年 / 177卷 / 01期
关键词
D O I
10.1103/PhysRev.177.245
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Recombination-dominated decaying plasmas in He, Ne, and Ar gases are produced in a discharge tube energized with a capacitor bank capable of delivering 3×103 J at 20 kV. The electron temperature, atom temperature, and electron number density as a function of time are measured by using a triple probe, a thin-film thermometer, and the triple probe and microwave apparatus, respectively. The atomic- and molecular-ion number densities are monitored by using a mass spectrometer. The electron-temperature dependence of the dissociative recombination coefficient α2, and the atom-temperature dependence of the molecularion formation coefficient γ are calculated. The results indicate the following: (1) the electron-temperature dependence and absolute value of α2 are both affected by the atom temperature of the plasma; a simplified physical model is proposed to explain this variation of dependence; the previous controversial experimental results published in the literature on this subject can be understood with the use of this physical model; and (2) the atom-temperature dependence of γ agrees with theoretical expectations. © 1969 The American Physical Society.
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页码:245 / &
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