OUTGASSING CAUSED BY ELECTRON BOMBARDMENT OF GLASS

被引：24

作者：

TODD, BJ

LINEWEAVER, JL

KERR, JT

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1960年 / 31卷 / 01期

关键词：

D O I：

10.1063/1.1735417

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：51 / 55

页数：5

相关论文

共 4 条

[1] NEW DEVELOPMENTS IN THE PRODUCTION AND MEASUREMENT OF ULTRA HIGH VACUUM [J].

ALPERT, D .

JOURNAL OF APPLIED PHYSICS, 1953, 24 (07) :860-876

[2] ELECTRON BOMBARDMENT EFFECTS IN THIN DIELECTRIC LAYERS [J].

SPEAR, WE .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1955, 68 (12) :991-1000

[3] OUTGASSING OF GLASS [J].

TODD, BJ .

JOURNAL OF APPLIED PHYSICS, 1955, 26 (10) :1238-1243

[4] PENETRATION OF ELECTRONS IN ALUMINUM OXIDE FILMS [J].

YOUNG, JR .

PHYSICAL REVIEW, 1956, 103 (02) :292-293