HIGH-QUALITY CARBON-DOPED BORON-NITRIDE MEMBRANE FOR X-RAY-LITHOGRAPHY MASK

被引：3

作者：

KISHIMOTO, A

SAKAKIHARA, M

KAWAI, T

OIZUMI, H

KUNIYOSHI, S

YAMAGUCHI, S

MOCHIJI, K

机构：

[1] HITACHI MET LTD,MAGNET & ELECTR MAT RES LAB,KUMAGAYA,SAITAMA 360,JAPAN

[2] HITACHI LTD,CTR SEMICOND DESIGN & DEV,KODAIRA,TOKYO 187,JAPAN

[3] TOHOKU UNIV,INST MAT RES,SENDAI,MIYAGI 980,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1992年 / 31卷 / 6A期

关键词：

X-RAY LITHOGRAPHY; X-RAY MASK; BNC; BN; RADIATION DAMAGE; LPCVD;

D O I：

10.1143/JJAP.31.L717

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Carbon-doped BN (BNC) membrane was fabricated by low pressure chemical vapor deposition (LPCVD) at a high temperature (750-degrees-C). Here, CH3NH2 was used as the reactive gas instead of NH3. The newly developed BNC has tensile stress and is transparent to visible light. A very small hydrogen content (3.3%) leads to the construction of strong atomic networks of B, N, and C, as well as to highly improved radiation stability.

引用

页码：L717 / L720

页数：4

共 4 条

[1] RADIATION-DAMAGE EFFECTS IN BORON-NITRIDE MASK MEMBRANES SUBJECTED TO X-RAY-EXPOSURES [J].