SUBMICRON PATTERNING TECHNIQUE FOR YBA2CU3OY FILMS USING FOCUSED ION-BEAM LITHOGRAPHY

被引：6
作者：
KUSUNOKI, M
AKAIKE, H
FUJIMAKI, A
HAYAKAWA, H
机构：
[1] Department of Electronics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 8A期
关键词：
SUBMICRO PATTERNING; FOCUSED ION BEAM LITHOGRAPHY; YBA2CU3OY; NB; THERMALLY ACTIVATED VORTEX MOTION;
D O I：
10.1143/JJAP.33.L1124
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have developed a new technique for YBa2Cu3Oy (YBCO) submicron structure formation. Nb films serving as etching masks are patterned into line structures with submicron dimensions, using focused ion beam lithography and a vertical etching technique of the Nb films. Then the mask patterns are accurately transferred to the YBCO film in an electron cyclotron resonance plasma etcher. Fine lines are successfully patterned down to 180 nm of the linewidth without any degradation of superconductivity, as long as a temperature rise is suppressed during plasma etching. The temperature dependence of the current-voltage characteristics can be interpreted in terms of the thermally activated vortex motion.
引用
收藏
页码：L1124 / L1127
页数：4
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