DESIGN AND MANUFACTURE OF SPUTTERED MULTILAYERS FOR APPLICATIONS TO SOFT-X-RAY OPTICS

被引：2
作者：
HOUDY, P
BOHER, P
机构：
来源：
JOURNAL DE PHYSIQUE III | 1994年 / 4卷 / 09期
关键词：
D O I：
10.1051/jp3:1994226
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Nanometer scale multilayers has been deposited using high vacuum diode rf sputtering chamber equipped with in situ kinetic ellipsometers. The influence of the composition, the roughness, the interface layer and the number of periods have been studied in order to optimize the stacks for soft X-ray reflection. The behaviour of the structures under thermal annealing has been observed. At last, gratings have been successfully manufactured.
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页码：1589 / 1598
页数：10
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