CAPACITANCE STUDIES OF CHARGE REDISTRIBUTION BETWEEN GAMMA-STATE AND X-STATE IN A GAAS/ALAS DOUBLE-BARRIER STRUCTURE AT HIGH-PRESSURE

被引:6
作者
AUSTING, DG [1 ]
KLIPSTEIN, PC [1 ]
ROBERTS, JS [1 ]
HILL, G [1 ]
机构
[1] UNIV SHEFFIELD, DEPT ELECT & ELECTR ENGN, FACIL 3 5, SHEFFIELD S1 3JD, S YORKSHIRE, ENGLAND
关键词
D O I
10.1063/1.355001
中图分类号
O59 [应用物理学];
学科分类号
摘要
Capacitance measurements as a function of bias provide evidence for the redistribution of electrons above the pressure induced type I to type II transition in a 43, 72, and 40 angstrom AlAs/GaAs double barrier structure (DBS). Measurements at 77 K for pressures up to 16 kbar allow the identification of low and high pressure regimes. In the low pressure regime the DBS exhibits a capacitance whose characteristic length includes both the barriers and the well, and any surrounding depletion regions. In the high pressure regime, the behavior is like that of a ''quantum capacitor,'' with plates only approximately 70 angstrom apart. This causes a marked increase in the zero bias capacitance, which is explained by electron transfer to the X wells in the AlAs regions. The subsequent variation of the capacitance with bias is consistent with a band bending model introduced previously, in which the Fermi level is pinned to the lowest X level in each well at low bias, but where the collector well is eventually depleted at larger bias.
引用
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页码:7340 / 7343
页数:4
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