THE ELECTROCHEMICAL AND PHOTOELECTROCHEMICAL BEHAVIOR OF PASSIVATED TI IN NITRIC-ACID SOLUTIONS

被引：17

作者：

FELSKE, A

BADAWY, WA

PLIETH, WJ

机构：

[1] Institut für Physikalische Chemie, Freien Universität Berlin

[2] Department of Chemistry, Faculty of Science, University of Cairo, Giza

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1990年 / 137卷 / 06期

关键词：

D O I：

10.1149/1.2086808

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The electrochemical and photoelectrochemical behavior of passivated Ti electrodes in nitric acid solutions was studied and compared with the behavior of the electrodes passivated in sulfuric acid under the same conditions. The donor density and flatband potentials were calculated from the capacitance measurements. The use of high intensity pulse lasers allowed photoelectrochemical investigations with photon energies smaller than the bandgap. The behavior of the passive films on Ti in nitric acid was not comparable with its behavior in H2SO4. The anomalous behavior of Ti passivated in nitric acid was discussed, and a model for the band structure of the passive film was suggested. © 1990, The Electrochemical Society, Inc. All rights reserved.

引用

页码：1804 / 1809

页数：6

共 34 条

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[2]

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