THE MECHANISM OF PHOTOCURE OF INHERENTLY PHOTOSENSITIVE POLYIMIDES CONTAINING A BENZOPHENONE GROUP

被引：22

作者：

SCAIANO, JC ^{[1
]}

NETTOFERREIRA, JC ^{[1
]}

BECKNELL, AF ^{[1
]}

SMALL, RD ^{[1
]}

机构：

[1] AT&T,ENGN RES CTR,PRINCETON,NJ 08540

来源：

关键词：

D O I：

10.1002/pen.760291411

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：942 / 944

页数：3

共 8 条

[1] AHNE H, 1984, POLYIMIDES SYNTHESIS, V2, P905
[2] KANAOKA K, 1972, TETRAHEDRON LETT, P4517
[3] ON THE CROSS-LINKING MECHANISM OF BENZOPHENONE-CONTAINING POLYIMIDES
LIN, AA
SASTRI, VR
TESORO, G
REISER, A
EACHUS, R
[J]. MACROMOLECULES, 1988, 21 (04) : 1165 - 1169
[4] MAZZOCCHI PH, 1981, ORG PHOTOCHEM, V5, P421
[5] PFEIFER J, 1985, 2ND P INT C POL NEW, P130
[6] PHOTOCHEMISTRY OF A BENZOPHENONE-CONTAINING BISIMIDE - A MODEL FOR INHERENTLY PHOTOSENSITIVE POLYIMIDES
SCAIANO, JC
BECKNELL, AF
SMALL, RD
[J]. JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 1988, 44 (01) : 99 - 110
[7] SUBSTITUENT EFFECTS ON HYDROGEN ABSTRACTION BY PHENYL KETONE TRIPLETS
WAGNER, PJ
TRUMAN, RJ
SCAIANO, JC
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1985, 107 (24) : 7093 - 7097
[8] 1962, Patent No. 267352