THE MECHANISM OF PHOTOCURE OF INHERENTLY PHOTOSENSITIVE POLYIMIDES CONTAINING A BENZOPHENONE GROUP

被引：22

作者：

SCAIANO, JC ^{[1
]}

NETTOFERREIRA, JC ^{[1
]}

BECKNELL, AF ^{[1
]}

SMALL, RD ^{[1
]}

机构：

[1] AT&T,ENGN RES CTR,PRINCETON,NJ 08540

来源：

POLYMER ENGINEERING AND SCIENCE | 1989年 / 29卷 / 14期

关键词：

D O I：

10.1002/pen.760291411

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：942 / 944

页数：3

共 8 条

[1]

AHNE H, 1984, POLYIMIDES SYNTHESIS, V2, P905

[2]

KANAOKA K, 1972, TETRAHEDRON LETT, P4517

[3] ON THE CROSS-LINKING MECHANISM OF BENZOPHENONE-CONTAINING POLYIMIDES [J].

LIN, AA ;

SASTRI, VR ;

TESORO, G ;

REISER, A ;

EACHUS, R .

MACROMOLECULES, 1988, 21 (04) :1165-1169

[4]

MAZZOCCHI PH, 1981, ORG PHOTOCHEM, V5, P421

[5]

PFEIFER J, 1985, 2ND P INT C POL NEW, P130

[6] PHOTOCHEMISTRY OF A BENZOPHENONE-CONTAINING BISIMIDE - A MODEL FOR INHERENTLY PHOTOSENSITIVE POLYIMIDES [J].

SCAIANO, JC ;

BECKNELL, AF ;

SMALL, RD .

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 1988, 44 (01) :99-110

[7] SUBSTITUENT EFFECTS ON HYDROGEN ABSTRACTION BY PHENYL KETONE TRIPLETS [J].

WAGNER, PJ ;

TRUMAN, RJ ;

SCAIANO, JC .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1985, 107 (24) :7093-7097

[8]

1962, Patent No. 267352

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