THICKNESS DEPENDENCE OF THE ELECTRONIC-STRUCTURE OF ULTRATHIN, EPITAXIAL NI(111)/W(110) LAYERS

被引：50
作者：
KAMPER, KP
SCHMITT, W
GUNTHERODT, G
KUHLENBECK, H
机构：
[1] UNIV COLOGNE,INST PHYS 2,D-5000 COLOGNE 41,FED REP GER
[2] UNIV OSNABRUCK,FACHBEREICH PHYS,D-4500 OSNABRUCK,FED REP GER
来源：
PHYSICAL REVIEW B | 1988年 / 38卷 / 14期
关键词：
D O I：
10.1103/PhysRevB.38.9451
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：9451 / 9456
页数：6
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