X-RAY PHOTOELECTRON AND INFRARED-SPECTROSCOPY OF MICROWAVE PLASMA ETCHED POLYIMIDE SURFACES

被引:25
作者
CHOU, NJ
PARASZCZAK, J
BABICH, E
HEIDENREICH, J
CHAUG, YS
GOLDBLATT, RD
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词
D O I
10.1116/1.574761
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1321 / 1326
页数:6
相关论文
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