X-RAY PHOTOELECTRON AND INFRARED-SPECTROSCOPY OF MICROWAVE PLASMA ETCHED POLYIMIDE SURFACES

被引：25
作者：
CHOU, NJ
PARASZCZAK, J
BABICH, E
HEIDENREICH, J
CHAUG, YS
GOLDBLATT, RD
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词：
D O I：
10.1116/1.574761
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1321 / 1326
页数：6
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