CHEMICAL VAPOR-DEPOSITION OF REFRACTORY-METALS DISILICIDES - A REVIEW

[1] A CRITICAL COMPARISON OF SILICIDE FILM DEPOSITION TECHNIQUES [J]. THIN SOLID FILMS, 1984, 118 (02) : 163 - 170

[2] AKITMOTO K, 1981, APPL PHYS LETT, V39, P445, DOI 10.1063/1.92733

[3] DEVELOPMENT OF THE SELF-ALIGNED TITANIUM SILICIDE PROCESS FOR VLSI APPLICATIONS [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1985, 20 (01) : 61 - 69

[4] CHEMICAL VAPOR-DEPOSITION OF METAL SILICIDES FROM ORGANOMETALLIC COMPOUNDS WITH SILICON METAL BONDS [J]. VACUUM, 1985, 35 (10-1) : 435 - 439

[5] CHEMICAL VAPOR-DEPOSITION OF TRANSITION-METAL SILICIDES BY PYROLYSIS OF SILYL TRANSITION-METAL CARBONYL-COMPOUNDS [J]. JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS, 1977, (20): : 2058 - 2061

[6] Barin I., 1973, THERMOCHEMICAL PROPE

[7] BERNARD C, 1987, 10TH P INT C CVD PEN, P700

[8] BERNARD C, 1981, 8TH P INT C CHEM VAP, P3

[9] BLANQUET E, 1989, IN PRESS THIN SOLID

[10] BLUM JM, 1987, 10TH P INT C CVD, P476

[1] A CRITICAL COMPARISON OF SILICIDE FILM DEPOSITION TECHNIQUES [J]. THIN SOLID FILMS, 1984, 118 (02) : 163 - 170

[2] AKITMOTO K, 1981, APPL PHYS LETT, V39, P445, DOI 10.1063/1.92733

[3] DEVELOPMENT OF THE SELF-ALIGNED TITANIUM SILICIDE PROCESS FOR VLSI APPLICATIONS [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1985, 20 (01) : 61 - 69

[4] CHEMICAL VAPOR-DEPOSITION OF METAL SILICIDES FROM ORGANOMETALLIC COMPOUNDS WITH SILICON METAL BONDS [J]. VACUUM, 1985, 35 (10-1) : 435 - 439

[5] CHEMICAL VAPOR-DEPOSITION OF TRANSITION-METAL SILICIDES BY PYROLYSIS OF SILYL TRANSITION-METAL CARBONYL-COMPOUNDS [J]. JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS, 1977, (20): : 2058 - 2061

[6] Barin I., 1973, THERMOCHEMICAL PROPE

[7] BERNARD C, 1987, 10TH P INT C CVD PEN, P700

[8] BERNARD C, 1981, 8TH P INT C CHEM VAP, P3

[9] BLANQUET E, 1989, IN PRESS THIN SOLID

[10] BLUM JM, 1987, 10TH P INT C CVD, P476