STUDY OF SEMICONDUCTOR SURFACES USING AN ATOM-PROBE FIELD-ION MICROSCOPE .1. HYDROGEN CHEMISORPTION ON SILICON

被引：12

作者：

SAKURAI, T

TSONG, TT

CULBERTSON, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期

关键词：

D O I：

10.1116/1.569649

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：647 / 649

页数：3

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