STUDY OF SEMICONDUCTOR SURFACES USING AN ATOM-PROBE FIELD-ION MICROSCOPE .1. HYDROGEN CHEMISORPTION ON SILICON

被引：12
|
作者：
SAKURAI, T
TSONG, TT
CULBERTSON, RJ
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期
关键词：
D O I：
10.1116/1.569649
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：647 / 649
页数：3
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