Growth mechanism and epitaxy of ultra-thin cobalt films on Pd(OO1)

被引：4

作者：

Giordano, H

Atrei, A

Rovida, G

Torrini, M

Bardi, U

机构：

[1] Dipartimento di Chimica, Università di Firenze, 50121 Firenze

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1995年 / 76卷

关键词：

D O I：

10.1016/0368-2048(95)02541-3

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Cobalt was vapor deposited in vacuum on the clean Pd(001) surface. The growth mode and the structure of the overlayer were studied by low energy He+ ion scattering (LEIS), X-ray photoelectron spectroscopy (XPS) and X-ray photoelectron diffraction (XPD). By examining the dependency of the LEIS signal as a function of the XPS one for various amounts of deposit it is possible to conclude that cobalt forms multi atomic layer islands. XPD shows that the cobalt structure is fcc with the (001) plane parallel to the substrate surface.

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页码：455 / 458

页数：4

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