FORMATION OF BURIED EPITAXIAL CO SILICIDES BY ION-IMPLANTATION

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作者：
KOHLHOF, K
MANTL, S
STRITZKER, B
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来源：
HETEROSTRUCTURES ON SILICON : ONE STEP FURTHER WITH SILICON | 1989年 / 160卷
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：239 / 245
页数：7
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