KINETICS OF THE CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE FROM SI(CH3)4/NH3/H2 GAS-MIXTURES

被引：5
|
作者：
ROELS, N
LECOINTE, T
GUINEBRETIERE, R
DESMAISON, J
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来源：
JOURNAL DE PHYSIQUE | 1989年 / 50卷 / C-5期
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D O I：
10.1051/jphyscol:1989555
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页码：435 / 444
页数：10
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