NOVEL DISLOCATION CONTRAST EFFECTS IN SCANNING-TRANSMISSION ELECTRON-MICROSCOPY

被引:0
作者
PEROVIC, DD
HOWIE, A
ROSSOUW, CJ
机构
[1] UNIV CAMBRIDGE,CAVENDISH LAB,CAMBRIDGE CB3 0HE,ENGLAND
[2] CSIRO,DIV MAT SCI & TECHNOL,CLAYTON,VIC 3168,AUSTRALIA
来源
MICROSCOPY OF SEMICONDUCTING MATERIALS 1993 | 1993年 / 134期
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D O I
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present novel experimental results on the imaging of dislocations in HAADF-STEM. Images of inclined 60 degrees dislocation segments in Si exhibit a number of novel contrast effects which have been shown to depend on the specific position of the dislocation in the foil. The dislocation contrast is initially very dark at the entrant foil surface and eventually exhibits oscillatory contrast at larger foil thicknesses. Ultimately, the dislocation contrast remains bright beyond a certain depth in the crystal towards the exit foil surface. A Bloch-wave scattering description has been formulated to consistently explain the observed contrast features.
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页码:763 / 766
页数:4
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