SOLID-STATE IONIC POLISHING OF DIAMOND

被引：1
作者：
YEHODA, JE [1 ]
CUOMO, JJ [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 14期
关键词：
D O I：
10.1063/1.113355
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A new process for polishing diamond is presented. The reaction and polishing take place at the interface of an oxygen superionic conductor (yittria-stabilized zirconia) and the diamond. Oxygen anions are transported to the interface under the influence of an electric field and react with the diamond. It is believed that a volatile product of CO and/or CO2 is formed during the polishing. The process takes place at moderately low temperatures, without mechanical motion, and can be accomplished in ambient air, making it an attractive and useful method. In addition, the process is damage-free with no polishing residue, as has been determined by energy dispersive x-ray analysis.© 1995 American Institute of Physics.
引用
收藏
页码：1750 / 1752
页数：3
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