POST-HYDROGENATION OF CVD DEPOSITED A-SI FILMS

被引：73

作者：

SOL, N

KAPLAN, D

DIEUMEGARD, D

DUBREUIL, D

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1980年 / 35-6卷 / JAN-期

关键词：

D O I：

10.1016/0022-3093(80)90609-2

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：291 / 296

页数：6

共 9 条

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[2]

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[3] DOPING AND ANNEALING EFFECTS ON ESR IN CHEMICALLY VAPOR-DEPOSITED AMORPHOUS SILICON [J].

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[4]

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[5] HYDROGENATION OF EVAPORATED AMORPHOUS SILICON FILMS BY PLASMA TREATMENT [J].

KAPLAN, D ;

SOL, N ;

VELASCO, G ;

THOMAS, PA .

APPLIED PHYSICS LETTERS, 1978, 33 (05) :440-442

[6] HYDROGENATION AND DEHYDROGENATION OF AMORPHOUS AND CRYSTALLINE SILICON [J].

PANKOVE, JI ;

LAMPERT, MA ;

TARNG, ML .

APPLIED PHYSICS LETTERS, 1978, 32 (07) :439-441

[7] DOPED AMORPHOUS-SEMICONDUCTORS [J].

SPEAR, WE .

ADVANCES IN PHYSICS, 1977, 26 (06) :811-845

[8]

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[9]

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