EPITAXIAL GROWTH WITH LIGHT IRRADIATION

被引:71
作者
KUMAGAWA, M
SUNAMI, H
TERASAKI, T
NISHIZAWA, JI
机构
关键词
D O I
10.1143/JJAP.7.1332
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1332 / +
页数:1
相关论文
共 18 条
[1]   KINETICS OF SILICON-SILICONTETRACHLORIDE REACTION IN A FLOW SYSTEM [J].
ALSTRUP, O ;
THOMAS, CO .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (03) :319-&
[2]   LOW-TEMPERATURE SILICON EPITAXY [J].
FRIESER, RG .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (04) :401-+
[3]  
HAREN RR, 1932, J AM CHEM SOC, V54, P3917
[4]   SELECTIVE EPITAXIAL DEPOSITION OF SILICON [J].
JOYCE, BD ;
BALDREY, JA .
NATURE, 1962, 195 (4840) :485-&
[5]  
KUMAGAWA M, 1966, B RESEARCH I ELECTRO, V1, P149
[6]  
LONG OA, 1957, P ROY SOC LOND A MAT, V240, P499
[7]   EPITAXIAL VAPOR GROWTH OF GE SINGLE CRYSTALS IN A CLOSED-CYCLE PROCESS [J].
MARINACE, JC .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1960, 4 (03) :248-255
[8]   INFRARED SPECTRA AND MOLECULAR STRUCTURES OF SIH3F, SIH3CL, AND SIH3BR [J].
NEWMAN, C ;
OLOANE, JK ;
POLO, SR ;
WILSON, MK .
JOURNAL OF CHEMICAL PHYSICS, 1956, 25 (05) :855-859
[9]  
NISHIZAWA J, 1961, J METALL SOC JPN, V25, P177
[10]  
NISHIZAWA J, 1961, J METALL SOC JPN, V25, P149