RELATIVE FREE-ENERGIES OF SI SURFACES

被引:78
作者
FOLLSTAEDT, DM
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1063/1.108760
中图分类号
O59 [应用物理学];
学科分类号
摘要
Cavities are formed by ion implanting (001) Si with He and annealing at 800-degrees-C to enlarge and to remove the He. Subsequent annealing at 600-degrees-C results in cavities with well-defined facets as seen in [110] cross section with transmission electron microscopy. The most frequently observed facets are {111} planes. A rounded surface is seen about the [001] direction of all cavities, and (110BAR) facets are seen less frequently. The cavities allow the equilibrium crystal shape of Si to be examined and the relative free energies of the observed planes to be measured. The surface free energies of {001} and {110} planes are found to be 1.09+/-0.07 and 1.07+/-0.03 times that of {111} planes, respectively.
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页码:1116 / 1118
页数:3
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