VOLTAMMETRY OF CU(II) IN THE PRESENCE OF POLYMETHACRYLATE

被引：20

作者：

DIAZCRUZ, JM ^{[1
]}

ARINO, C ^{[1
]}

ESTEBAN, M ^{[1
]}

CASASSAS, E ^{[1
]}

机构：

[1] UNIV BARCELONA,FAC QUIM,DEPT QUIM ANAL,AV DIAGONAL 647,E-08028 BARCELONA,SPAIN

来源：

ANALYTICA CHIMICA ACTA | 1993年 / 273卷 / 1-2期

关键词：

POLAROGRAPHY; STRIPPING VOLTAMMETRY; VOLTAMMETRY; COPPER; METAL POLYACID COMPLEXES; POLYMETHACRYLATE;

D O I：

10.1016/0003-2670(93)80168-K

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

A systematic study of the voltammetric reduction of Cu(II) in the presence of polymethacrylic acid (PMA) was carried out by means of sampled direct current, normal pulse, differential pulse and reverse pulse polarography, cyclic voltammetry and differential pulse anodic stripping voltammetry. Titrations of Cu(II) with partially neutralized PMA allow the determination of the apparent formation constant, K, of the Cu-PMA system.

引用

页码：289 / 296

页数：8

共 20 条

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