APPEARANCE OF SINGLE-CRYSTALLINE PROPERTIES IN FINE-PATTERNED SI THIN-FILM TRANSISTORS (TFTS) BY SOLID-PHASE CRYSTALLIZATION (SPC)

被引:66
作者
NOGUCHI, T
机构
[1] VLSI R and D Laboratories, Sony Corporation, Atsugi, Kanagawa
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1993年 / 32卷 / 11A期
关键词
TFT; POLYSILICON; MOBILITY; GATE VOLTAGE SWING; GRAIN SIZE; UNIFORMITY; SINGLE CRYSTAL;
D O I
10.1143/JJAP.32.L1584
中图分类号
O59 [应用物理学];
学科分类号
摘要
Uniformity of thin film transistor (TFT) characteristics was evaluated by varying the channel size. As channel length decreased and width fell below 1 mum, uniformity was degraded drastically. A few samples showed high-performance characteristics such as sharp gate voltage swing below 100 mV/dec and high mobility as high as 100 cm2 /V.s near room temperature. Upon evaluation of their temperature dependence, the conduction mechanism showed not polycrystalline but single-crystal-like properties in the lattice scattering. The improved TFTs are thought to have been formed in grain boundary-free crystal grains.
引用
收藏
页码:L1584 / L1587
页数:4
相关论文
共 11 条
[1]  
Hayashi Y., 1991, Proceedings of the S.I.D., V32, P297
[2]   STOCHASTIC-MODEL FOR GRAIN-SIZE VERSUS DOSE IN IMPLANTED AND ANNEALED POLYCRYSTALLINE SILICON FILMS ON SIO2 [J].
IVERSON, RB ;
REIF, R .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) :5169-5175
[3]   CHARACTERISTICS OF MOSFETS ON LARGE-GRAIN POLYSILICON FILMS [J].
KATOH, T .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (07) :923-928
[4]   MANIPULATION OF NUCLEATION SITES IN SOLID-STATE SI CRYSTALLIZATION [J].
KUMOMI, H ;
YONEHARA, T ;
NOMA, T .
APPLIED PHYSICS LETTERS, 1991, 59 (27) :3565-3567
[5]   CHARACTERISTICS AND 3-DIMENSIONAL INTEGRATION OF MOSFETS IN SMALL-GRAIN LPCVD POLYCRYSTALLINE SILICON [J].
MALHI, SDS ;
SHICHIJO, H ;
BANERJEE, SK ;
SUNDARESAN, R ;
ELAHY, M ;
POLLACK, GP ;
RICHARDSON, WF ;
SHAH, AH ;
HITE, LR ;
WOMACK, RH ;
CHATTERJEE, PK ;
LAM, HW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) :258-281
[6]   CONSTANT MOBILITY OF TFT WITH DENDRITIC CRYSTALLIZED SILICON IN WIDE TEMPERATURE-RANGE AND RING OSCILLATOR CHARACTERISTICS [J].
NOGUCHI, T ;
KANAISHI, Y .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (12) :543-546
[7]   ADVANCED SUPERTHIN POLYSILICON FILM OBTAINED BY SI+ IMPLANTATION AND SUBSEQUENT ANNEALING [J].
NOGUCHI, T ;
HAYASHI, H ;
OHSHIMA, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (07) :1771-1777
[8]  
NOGUCHI T, 1991, P INT C SOLID STATE, P620
[9]  
OHSHIMA H, 1993, SID 93, P387
[10]   ELECTRICAL PROPERTIES OF POLYCRYSTALLINE SILICON FILMS [J].
SETO, JYW .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (12) :5247-5254