DIAMOND CHEMICAL VAPOR-DEPOSITION

被引：140
作者：
CELII, FG [1 ]
BUTLER, JE [1 ]
机构：
[1] USN,RES LAB,GAS SURFACE DYNAM SECT,WASHINGTON,DC 20375
来源：
ANNUAL REVIEW OF PHYSICAL CHEMISTRY | 1991年 / 42卷 / 01期
关键词：
OPTICAL DIAGNOSTICS; INSITU TECHNIQUES; GROWTH MODELING; GAS-PHASE KINETICS; NUCLEATION;
D O I：
10.1146/annurev.pc.42.100191.003235
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：643 / 684
页数：42
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