ELECTRON-BEAM EFFECTS DURING THE SPUTTER PROFILING OF THIN AU-AG FILMS ANALYZED BY AUGER-ELECTRON SPECTROSCOPY

被引：21
|
作者：
HOFMANN, S [1 ]
ZALAR, A [1 ]
机构：
[1] INST ELECTR & VACUUM TECH,LJUBLJANA,YUGOSLAVIA
来源：
THIN SOLID FILMS | 1979年 / 56卷 / 03期
关键词：
D O I：
10.1016/0040-6090(79)90135-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：337 / 342
页数：6
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