ELECTRON-BEAM EFFECTS DURING THE SPUTTER PROFILING OF THIN AU-AG FILMS ANALYZED BY AUGER-ELECTRON SPECTROSCOPY

被引：21

作者：

HOFMANN, S ^{[1
]}

ZALAR, A ^{[1
]}

机构：

[1] INST ELECTR & VACUUM TECH,LJUBLJANA,YUGOSLAVIA

来源：

THIN SOLID FILMS | 1979年 / 56卷 / 03期

关键词：

D O I：

10.1016/0040-6090(79)90135-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：337 / 342

页数：6

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