LOW-TEMPERATURE RELEASE OF ION-IMPLANTED HELIUM FROM NICKEL

被引：14
作者：
POKER, DB
WILLIAMS, JM
机构：
来源：
APPLIED PHYSICS LETTERS | 1982年 / 40卷 / 09期
关键词：
D O I：
10.1063/1.93253
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：851 / 853
页数：3
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