TIN DIOXIDE THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION FROM TIN(II) ACETYLACETONATE

被引：15

作者：

MARUYAMA, T

IKUTA, Y

机构：

[1] Department of Chemical Engineering, Faculty of Engineering, Kyoto University, Sakyo-ku, Kyoto, 606, Yoshida-Honmachi

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 1992年 / 28卷 / 03期

关键词：

D O I：

10.1016/0927-0248(92)90029-O

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Tin dioxide thin films were prepared by a low-temperature atmospheric-pressure chemical vapor deposition method in air. The raw material was tin(II) acetylacetonate. At a reaction temperature above 230-degrees-C, polycrystalline thin films were obtained with a high deposition rate. When the thickness of film is larger than 1000 nm, the texture coefficients show a dominant [002] orientation, which is independent of both substrate temperature and vapor pressure of source material.

引用

页码：209 / 215

页数：7

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