THERMAL DEPOSITION OF TIS FILMS FROM VOLATILE TI(SBUT)4

被引：42

作者：

BOCHMANN, M

HAWKINS, I

WILSON, LM

机构：

来源：

JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS | 1988年 / 05期

关键词：

D O I：

10.1039/c39880000344

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：344 / 345

页数：2

共 7 条

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