THE EFFECT OF RF POWER ON REACTIVELY SPUTTERED ZINC-OXIDE

被引：39

|

作者：

AITA, CR ^{[1
]}

LAD, RJ ^{[1
]}

TISONE, TC ^{[1
]}

机构：

[1] ELECTR MAT CORP,AZUSA,CA 91702

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 12期

关键词：

D O I：

10.1063/1.327585

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：6405 / 6410

页数：6

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