TUNNELING INTO INTERFACE STATES OF MOS STRUCTURES

被引:20
作者
DAHLKE, WE
机构
关键词
D O I
10.1063/1.1754801
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:261 / &
相关论文
共 6 条
[1]   CURRENT TRANSPORT IN METAL-SEMICONDUCTOR BARRIERS [J].
CROWELL, CR ;
SZE, SM .
SOLID-STATE ELECTRONICS, 1966, 9 (11-1) :1035-&
[2]  
CROWELL CR, 1965, J APPL PHYS, V36, P3343
[3]   IMPROVED PROPERTIES OF SILICON DIOXIDE LAYERS GROWN UNDER BIAS [J].
GOETZBERGER, A .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (2P1) :138-+
[4]   AU-N-TYPE GAAS SCHOTTKY BARRIER + ITS VARACTOR APPLICATION [J].
KAHNG, D .
BELL SYSTEM TECHNICAL JOURNAL, 1964, 43 (1P1) :215-+
[5]  
NICOLLIAN EH, TO BE PUBLISHED
[6]  
WAXMAN AS, 1966, THESIS PRINCETON U