THE DUPLEX STRUCTURE OF CELL-WALLS OF POROUS ANODIC FILMS FORMED ON ALUMINUM

被引：61
|
作者：
ONO, S
MASUKO, N
机构：
[1] Institute of Industrial Science, The University of Tokyo, Minato-ku, Tokyo, 106, Roppongi
来源：
CORROSION SCIENCE | 1992年 / 33卷 / 03期
关键词：
D O I：
10.1016/0010-938X(92)90078-H
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The depth and the amount of anion incorporation into the cell walls of porous anodic films formed in a phosphoric acid solution have been studied using TEM and EDX. Both increased with increasing forming voltage; however, a duplex structure could not confirmed for films formed at voltages below 10V.
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页码：503 / &
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