EXCITATION TEMPERATURE AND ELECTRON NUMBER DENSITY-MEASUREMENTS IN AN INDUCTIVELY-COUPLED PLASMA SOURCE

被引：0

作者：

MURTY, PS

RAO, SVNB

BISWAS, SS

机构：

来源：

INDIAN JOURNAL OF PURE & APPLIED PHYSICS | 1993年 / 31卷 / 11期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Using spectroscopic techniques, excitation temperature and electron number density were determined for an inductively coupled plasma source operated at a frequency of 56 MHz and 1.5 kW forward power. The excitation temperature showed a difference of 800 K when measured by employing two different methods. This could be attributed to the non-LTE nature of the plasma source.

引用

页码：804 / 807

页数：4