PHOSPHORUS DIFFUSION IN PARTIALLY CRYSTALLIZED FILMS OF SIO2

被引:7
|
作者
CAMPBELL, DR [1 ]
ALESSAND.EI [1 ]
TU, KN [1 ]
LEWIS, JE [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1149/1.2401981
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1081 / 1085
页数:5
相关论文
共 50 条
  • [1] PHOSPHORUS DIFFUSION AND CATALYZED CRYSTALLIZATION IN AMORPHOUS FILMS OF SIO2
    CAMPBELL, DR
    ALESSAND.EI
    TU, KN
    LEWIS, JE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (08) : C238 - &
  • [3] OBSERVATIONS ON PHOSPHORUS STABILIZED SIO2 FILMS
    YAMIN, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (07) : C149 - &
  • [4] DIFFUSION OF PHOSPHORUS INTO SILICON FROM DOPED SIO2
    NISNEVICH, YD
    INORGANIC MATERIALS, 1984, 20 (08) : 1198 - 1200
  • [5] Diffusion and Interaction of In and As Implanted into SiO2 Films
    Tyschenko, I. E.
    Voelskow, M.
    Mikhaylov, A. N.
    Tetelbaum, D. I.
    SEMICONDUCTORS, 2019, 53 (08) : 1004 - 1010
  • [6] Diffusion and segregation of carbon in SiO2 films
    Mizushima, I
    Kamiya, E
    Arai, N
    Sonoda, M
    Yoshiki, M
    Takagi, S
    Wakamiya, M
    Kambayashi, S
    Mikata, Y
    Mori, S
    Kashiwagi, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (3B): : 1465 - 1468
  • [7] Diffusion and Interaction of In and As Implanted into SiO2 Films
    I. E. Tyschenko
    M. Voelskow
    A. N. Mikhaylov
    D. I. Tetelbaum
    Semiconductors, 2019, 53 : 1004 - 1010
  • [8] Phosphorus diffusion from doped polysilicon through ultrathin SiO2 films into Si substrates
    Tsubo, Y
    Komatsu, Y
    Saito, K
    Matsumoto, S
    Sato, Y
    Yamamoto, I
    Yamashita, Y
    PROCEEDINGS OF THE FIFTH INTERNATIONAL SYMPOSIUM ON PROCESS PHYSICS AND MODELING IN SEMICONDUCTOR TECHNOLOGY, 1999, 99 (02): : 116 - 122
  • [9] ZINC DIFFUSION IN GAAS THROUGH SIO2 FILMS
    SHORTES, SR
    WURST, EC
    KANZ, JA
    TRANSACTIONS OF THE METALLURGICAL SOCIETY OF AIME, 1964, 230 (02): : 300 - &
  • [10] Hydrodechlorination of chlorobenzene over NiB/SiO2 and NiP/SiO2 amorphous catalysts after being partially crystallized: A consideration of electronic and geometrical factors
    Chen, Jixiang
    Ci, Donghui
    Wang, Rijie
    Zhang, Jiyan
    APPLIED SURFACE SCIENCE, 2008, 255 (05) : 3300 - 3309