STRUCTURE CHANGE AND RESISTIVITY STEP OF EVAPORATED GE FILMS IN DEPENDENCE ON SUBSTRATE TEMPERATURE

被引：14

作者：

GOEBEL, H ^{[1
]}

DETTMER, K ^{[1
]}

KESSLER, FR ^{[1
]}

机构：

[1] TECH UNIV BRUNSWICK,INST PHYS B,BRUNSWICK,WEST GERMANY

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1973年 / 16卷 / 01期

关键词：

D O I：

10.1002/pssa.2210160105

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：61 / 68

页数：8

共 31 条

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[10]

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