Processing, Characterization, and Potential Applications of YBa2Cu3O7/Au YBa2Cu3O7/Au/Si Superconducting Thin Films Fabricated by Rapid Isothermal Processing Assisted Metalorganic Chemical Vapor Deposition

被引：20

作者：

Singh, R. ^{[1
]}

Ng, J. T. C. ^{[1
]}

Singh, R. K. ^{[2
]}

Qian, F. ^{[2
]}

Hsu, N. J. ^{[3
]}

Krueger, D. J. ^{[3
]}

机构：

[1] Clemson Univ, Dept Elect & Comp Engn, Clemson, SC 29631 USA

[2] Univ Florida, Dept Mat Sci Engn, Gainesville, FL 32611 USA

[3] Univ Oklahoma, Sch Elect Engn & Comp Sci, Norman, OK 73019 USA

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1993年 / 3卷 / 01期

关键词：

D O I：

10.1109/77.233414

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

For many device applications, it is desirable to grow thin films of high temperature superconductors on conducting substrates. Metalorganic chemical vapor deposition (MOCVD) is considered as an ideal technique for the deposition of high temperature superconducting thin films and related materials. Rapid isothermal processing (RIP) based on incoherent radiation as the sources of light is emerging as a low thermal budget (integral of processing time and temperature) processing technique. We have used RIP assisted MOCVD for the deposition of high quality films of YBa2Cu3O7 (YBCO) on insulating substrates at temperature as low as 610 degrees C. We report the results of processing and characterization of YBCO films deposited on bulk gold foils and Au/Si substrates by RIP assisted MOCVD. By using the YBCO/Au foils, we show improvement in the performance of Au/YBCO/n-Si Schottky diodes operating at 50 K.

引用

页码：1 / 7

页数：7

共 22 条

[1] PERFORMANCE OF 600-V N-CHANNEL IGBTS AT LOW-TEMPERATURES [J].

CHOW, TP ;

SO, KC ;

LAU, D .

IEEE ELECTRON DEVICE LETTERS, 1991, 12 (09) :498-499

[2] INPLANE ALIGNED YBA2CU3O7-X THIN-FILMS DEPOSITED ON POLYCRYSTALLINE METALLIC SUBSTRATES [J].

IIJIMA, Y ;

TANABE, N ;

KOHNO, O ;

IKENO, Y .

APPLIED PHYSICS LETTERS, 1992, 60 (06) :769-771

[3] HIGH-TEMPERATURE SUPERCONDUCTING YBA2CU3O7-X FILMS ON METALLIC SUBSTRATES GROWN INSITU BY OFF-AXIS SPUTTERING [J].

JIA, QX ;

ANDERSON, WA .

APPLIED PHYSICS LETTERS, 1992, 60 (21) :2689-2691

[4]

Kogelschatz U., 1991, MAT DES, V12, P251, DOI [10.1016/0261-3069(91)90005-O, DOI 10.1016/0261-3069(91)90005-O]

[5] SYNTHESIS OF SUPERCONDUCTING YBA2CU3O7-DELTA THIN-FILMS ON NICKEL-BASED SUPERALLOY USING INSITU PULSED LASER DEPOSITION [J].

KUMAR, A ;

GANAPATHI, L ;

KANETKAR, SM ;

NARAYAN, J .

APPLIED PHYSICS LETTERS, 1990, 57 (24) :2594-2596

[6] SINGLE-CHAMBER, INSITU PROCESSING OF SUPERCONDUCTING YBA2CU3O7-DELTA THIN-FILMS ON STAINLESS-STEEL WITH YTTRIA-STABILIZED ZIRCONIA BUFFER LAYER [J].

KUMAR, A ;

GANAPATHI, L ;

KANETKAR, SM ;

NARAYAN, J .

JOURNAL OF APPLIED PHYSICS, 1991, 69 (04) :2410-2413

[7] SR2RUO4 - A METALLIC SUBSTRATE FOR THE EPITAXIAL-GROWTH OF YBA2CU3O7-DELTA [J].

LICHTENBERG, F ;

CATANA, A ;

MANNHART, J ;

SCHLOM, DG .

APPLIED PHYSICS LETTERS, 1992, 60 (09) :1138-1140

[8] Y-BA-CU-O SUPERCONDUCTING FILMS WITH HIGH-JC VALUES BY MOCVD USING BA-ADDITION PRODUCTS [J].

MATSUNO, S ;

UCHIKAWA, F ;

YOSHIZAKI, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1990, 29 (06) :L947-L948

[9] SUPERCONDUCTING YBA2CU3O6.8 FILMS ON METALLIC SUBSTRATES USING INSITU LASER DEPOSITION [J].

NARUMI, E ;

SONG, LW ;

YANG, F ;

PATEL, S ;

KAO, YH ;

SHAW, DT .

APPLIED PHYSICS LETTERS, 1990, 56 (26) :2684-2686

[10] INSITU ALL-LASER PROCESS FOR DEPOSITION OF Y1BA2CU3O7-DELTA FILM ON STAINLESS-STEEL INVOLVING USE OF Y-ZRO2-AG COMPOSITE AS A BARRIER LAYER [J].

OGALE, SB ;

KOINKAR, VN ;

VISWANATHAN, R ;

ROY, SD ;

KANETKAR, SM .

APPLIED PHYSICS LETTERS, 1991, 59 (15) :1908-1910

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