Photoluminescent properties of undoped GaN prepared by atmospheric vapor phase epitaxy

被引:3
|
作者
Yi, GC
Wessels, BW
机构
来源
ICDS-18 - PROCEEDINGS OF THE 18TH INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS, PTS 1-4 | 1995年 / 196-卷
关键词
GaN; photoluminescence; atmospheric metal-organic vapor phase epitaxy;
D O I
10.4028/www.scientific.net/MSF.196-201.49
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The photoluminescent properties of GaN prepared by metal-organic vapor phase epitaxy were studied. Strong near band edge luminescence was observed. High resolution photoluminescence spectroscopy indicated three transitions at 3.472, 3.482 and 3.49 eV. The two higher energy transitions are ascribed to free excitons and the lower energy transition to a bound exciton. The photoluminescent properties of samples grown under different conditions were analyzed.
引用
收藏
页码:49 / 53
页数:5
相关论文
共 50 条
  • [21] Effect of Pretreatment of the Silicon Substrate on the Properties of GaN Films Grown by Chloride–Hydride Vapor-Phase Epitaxy
    P. V. Seredin
    K. A. Barkov
    D. L. Goloshchapov
    A. S. Lenshin
    Yu. Yu. Khudyakov
    I. N. Arsentiev
    A. A. Lebedev
    Sh. Sh. Sharofidinov
    A. M. Mizerov
    I. A. Kasatkin
    Tatiana Prutskij
    Semiconductors, 2021, 55 : 995 - 1001
  • [22] Photoluminescence of GaN : Mg grown by metalorganic vapor-phase epitaxy (MOVPE)
    Lim, PH
    Schineller, B
    Schön, O
    Heime, K
    Heuken, M
    JOURNAL OF CRYSTAL GROWTH, 1999, 205 (1-2) : 1 - 10
  • [23] Effect of high temperature GaN buffer layer on the growth of thick GaN by hydride vapor phase epitaxy
    Zhang, W
    Alves, HR
    Bläsing, J
    Hofmann, DM
    Krost, A
    Meyer, BK
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 46 - 48
  • [24] Strain in GaN Epi-Layer Grown by Hydride Vapor Phase Epitaxy
    Liu Zhan-hui
    Xiu Xiang-qian
    Zhang Li-li
    Zhang Rong
    Zhang Ya-nan
    Su Jing
    Xie Zi-li
    Liu Bin
    Shan Yun
    SPECTROSCOPY AND SPECTRAL ANALYSIS, 2013, 33 (08) : 2105 - 2108
  • [25] Extended defects and polarity of hydride vapor phase epitaxy GaN
    J. Jasinski
    Z. Liliental-Weber
    Journal of Electronic Materials, 2002, 31 : 429 - 436
  • [26] Metalorganic vapor phase epitaxy of wurtzite InP nanowires on GaN
    Kauppinen, Christoffer
    Haggren, Tuomas
    Lipsanen, Harri
    Sopanen, Markku
    APPLIED PHYSICS LETTERS, 2020, 116 (09)
  • [27] Si Doping of GaN in Hydride Vapor-Phase Epitaxy
    E. Richter
    T. Stoica
    U. Zeimer
    C. Netzel
    M. Weyers
    G. Tränkle
    Journal of Electronic Materials, 2013, 42 : 820 - 825
  • [28] Growth of thick GaN layers by hydride vapor phase epitaxy
    Monemar, B
    Paskova, T
    Hemmingsson, C
    Larsson, H
    Paskov, PP
    Ivanov, IG
    Kasic, A
    JOURNAL OF CERAMIC PROCESSING RESEARCH, 2005, 6 (02): : 153 - 162
  • [29] Si Doping of GaN in Hydride Vapor-Phase Epitaxy
    Richter, E.
    Stoica, T.
    Zeimer, U.
    Netzel, C.
    Weyers, M.
    Traenkle, G.
    JOURNAL OF ELECTRONIC MATERIALS, 2013, 42 (05) : 820 - 825
  • [30] Hydride vapor phase epitaxy reactor for bulk GaN growth
    Voronenkov, Vladislav
    Bochkareva, Natalia
    Gorbunov, Ruslan
    Zubrilov, Andrey
    Kogotkov, Viktor
    Latyshev, Philippe
    Lelikov, Yuri
    Leonidov, Andrey
    Shreter, Yuri
    2019 COMPOUND SEMICONDUCTOR WEEK (CSW), 2019,