PROPERTIES OF RF-SPUTTERED AL2O3 FILMS DEPOSITED BY PLANAR MAGNETRON

被引：87

作者：

NOWICKI, RS ^{[1
]}

机构：

[1] HEWLETT PACKARD CO,CUPERTINO,CA 95014

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569103

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：127 / 133

页数：7

共 20 条

[1] GROWTH OF HYDROUS OXIDE-FILMS ON ALUMINUM [J].

ALWITT, RS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (10) :1322-1328

[2] SOME CHARGE PHENOMENA IN D-C REACTIVELY SPUTTERED ALUMINA FILMS ON SILICON [J].

CHEN, MC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) :591-+

[3] PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS [J].

CHU, WK ;

MAYER, JW ;

NICOLET, MA ;

BUCK, TM ;

AMSEL, G ;

EISEN, F .

THIN SOLID FILMS, 1973, 17 (01) :1-41

[4] NONDESTRUCTIVE ANALYSIS FOR TRACE AMOUNTS OF HYDROGEN [J].

COHEN, BL ;

DEGNAN, JH ;

FINK, CL .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (01) :19-&

[5]

DOO VY, 1969, NAS12667FL4948 CONTR

[6]

GRANTHAM DH, 1969, 3RD S DEP THIN FILMS

[7]

KENNEDY TM, 1974, ELECTRON PACK PROD, V14, P136

[8] RECENT DEVELOPMENTS IN STUDY OF MECHANICAL PROPERTIES OF THIN-FILMS [J].

KINOSITA, K .

THIN SOLID FILMS, 1972, 12 (01) :17-&

[9] CONTROL OF RF SPUTTERED FILM PROPERTIES THROUGH SUBSTRATE TUNING [J].

LOGAN, JS .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) :172-&

[10]

LOGAN JS, 1970, IBM J RES DEV, V14, P176

← 1 2 →